WebbThe Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped … WebbField Service Techniker (m/f/d) – Raith – Nanofabrication systems for ... ... Login. Search
Downloads of safety Data Sheets Raith Group
WebbRaith Eline SOP - Princeton University WebbRaith's E_LiNE plus system enables advanced electron beam lithography (EBL) with the following writing specifications: Minimum Grating periodicity: Maximum 40 nm period with <20 nm line width Minimum Feature Size: Minimum line width < 10 n Stitching accuracy: Mean 3σ≤40nm Overlay accuracy: Mean 3σ≤40nm things that cure cancer
Downlads of nanofabrication literature Raith Group
WebbAuflösung: Standard 800 nm, Optional bis 300 nm. EVG Al-4 Maskaligner. bis zu 4“-Substrate, bis zu 5“-Masken. Raith eLine Elektronenstrahlithographie. hochauflösend bis <20 nm Strukturbreite. 100 x 100 mm interferometrisch gesteuerter Tisch. Positionsgenauigkeit 2 nm in x- und y-Richtung. Webb"The Raith eLINE Plus is our standard tool for advanced nanofabrication. Its superior performance in terms of stability, reliability, and scalability lays the foundation for our … WebbEvery system in Raith’s broad portfolio has its own specification and strength. Find out which of our systems can best solve your nanofabrication task, and download our product information. Brochures … salads for christmas dinner nz